Congrats to Aamod for winning the best student paper award (and a handful of $$) at the 2015 SPIE conference on Advanced Lithography!
The award-winning paper was:
A. Shanker, M. Sczyrba, B. Connolly, F. Kalk, A. Neureuther, L. Waller, “Characterizing the dependence of thick-mask edge effects on feature size and illumination angle using AIMS images,” in SPIE Optical Microlithography XXVIII conference of Advanced Lithography, paper 9426-23, February 2015, San Jose, CA.
