Conference papers

@inproceedings{eckert2017modeling,

title = {Modeling light propagation in 3D phase objects},

author = { Regina Eckert and Nicole A Repina and Michael Chen and Yishuang Liang and Ren Ng and Laura Waller},

url = {https://doi.org/10.1364/3D.2017.DW2F.2},

year  = {2017},

date = {2017-06-26},

booktitle = {3D Image Acquisition and Display: Technology, Perception and Applications},

pages = {DW2F--2},

organization = {Optical Society of America},

keywords = {multiple-scattering, optical models},

pubstate = {published},

tppubtype = {inproceedings}

}

@inproceedings{10.1117/12.2260412,

title = {Rigorous 3D electromagnetic simulation of ultrahigh efficiency EUV contact-hole printing with chromeless phase shift mask},

author = {Stuart Sherwin and Thomas V Pistor and Andrew Neureuther and Patrick Naulleau},

editor = {Eric M Panning},

url = {https://doi.org/10.1117/12.2260412},

doi = {10.1117/12.2260412},

year  = {2017},

date = {2017-03-24},

booktitle = {Extreme Ultraviolet (EUV) Lithography VIII},

volume = {10143},

pages = {232 -- 240},

publisher = {SPIE},

organization = {International Society for Optics and Photonics},

keywords = {EUV, lithography, optical models},

pubstate = {published},

tppubtype = {inproceedings}

}

@inproceedings{claus2014effect,

title = {Effect of amplitude roughness on EUV mask specifications},

author = { Rene A Claus and Andrew R Neureuther and Patrick P Naulleau and Laura Waller},

url = {https://doi.org/10.1117/12.2069073},

doi = {10.1117/12.2069073},

year  = {2014},

date = {2014-10-08},

booktitle = {Photomask Technology 2014},

volume = {9235},

pages = {92351A},

organization = {International Society for Optics and Photonics},

keywords = {EUV, optical models},

pubstate = {published},

tppubtype = {inproceedings}

}

@inproceedings{claus2014predicting,

title = {Predicting LER PSD caused by mask roughness using a mathematical model},

author = { Rene A Claus and Andrew R Neureuther and Laura Waller and Patrick P Naulleau},

url = {https://doi.org/10.1117/12.2046637},

doi = {10.1117/12.2046637},

year  = {2014},

date = {2014-04-17},

booktitle = {Extreme Ultraviolet (EUV) Lithography V},

volume = {9048},

pages = {90482X},

organization = {International Society for Optics and Photonics},

keywords = {EUV, optical models},

pubstate = {published},

tppubtype = {inproceedings}

}

@inproceedings{davidovits2011instability,

title = {Instability dynamics in photonic plasma},

author = { Seth Davidovits and Laura Waller and Stefan Muenzel and Can Sun and Dmitry V Dylov and Jason W Fleischer},

url = {http://meetings.aps.org/Meeting/DPP11/Session/GP9.31},

year  = {2011},

date = {2011-11-14},

booktitle = {53rd Annual Meeting of the APS Division of Plasma Physics },

journal = {Bulletin of the American Physical Society},

volume = {56},

number = {16},

publisher = {American Physical Society},

keywords = {optical models},

pubstate = {published},

tppubtype = {inproceedings}

}