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Conference papers

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Stuart Sherwin; Laura Waller; Andrew R Neureuther; Patrick P Naulleau

Advanced multilayer mirror design to mitigate EUV shadowing Inproceedings

In: Extreme Ultraviolet (EUV) Lithography X, pp. 1095715, International Society for Optics and Photonics 2019.

Links | BibTeX | Tags: aperiodic Mmultilayer mirror, EUV, EUV mask imaging, experimental design, multilayer, pyTorch