Conference papers
Field-varying aberration recovery in EUV microscopy using mask roughness Inproceedings
In: Computational Optical Sensing and Imaging, pp. CW2E–2, Optical Society of America 2018.
Speckle metrology for extreme ultra-violet lithography Inproceedings
In: Extreme Ultraviolet (EUV) Lithography IX, pp. 105830T, International Society for Optics and Photonics 2018.
Optical transfer function characterization using a weak diffuser Inproceedings
In: Three-Dimensional and Multidimensional Microscopy: Image Acquisition and Processing XXIII, pp. 971315, International Society for Optics and Photonics 2016.