Stuart Sherwin

@article{Li:23,

title = {Exceeding the limits of algorithmic self-calibrated aberration recovery in Fourier ptychography},

author = {Eric Li and Stuart Sherwin and Gautam Gunjala and Laura Waller},

url = {https://opg.optica.org/optcon/abstract.cfm?URI=optcon-2-1-119},

doi = {10.1364/OPTCON.475990},

year  = {2023},

date = {2023-01-01},

journal = {Opt. Continuum},

volume = {2},

number = {1},

pages = {119--130},

publisher = {Optica Publishing Group},

abstract = {Fourier ptychographic microscopy is a computational imaging technique that provides quantitative phase information and high resolution over a large field-of-view. Although the technique presents numerous advantages over conventional microscopy, model mismatch due to unknown optical aberrations can significantly limit reconstruction quality. A practical way of correcting for aberrations without additional data capture is through algorithmic self-calibration, in which a pupil recovery step is embedded into the reconstruction algorithm. However, software-only aberration correction is limited in accuracy. Here, we evaluate the merits of implementing a simple, dedicated calibration procedure for applications requiring high accuracy. In simulations, we find that for a target sample reconstruction error, we can image without any aberration corrections only up to a maximum aberration magnitude of $łambda$/40. When we use algorithmic self-calibration, we can tolerate an aberration magnitude up to $łambda$/10 and with our proposed diffuser calibration technique, this working range is extended further to $łambda$/3. Hence, one can trade off complexity for accuracy by using a separate calibration process, which is particularly useful for larger aberrations.},

keywords = {},

pubstate = {published},

tppubtype = {article}

}

@article{10.1117/1.JMM.20.3.031011,

title = {Picometer sensitivity metrology for EUV absorber phase},

author = {Stuart Sherwin and Isvar Cordova and Ryan Miyakawa and Markus Benk and Laura Waller and Andrew Neureuther and Patrick Naulleau},

url = {https://doi.org/10.1117/1.JMM.20.3.031011},

doi = {10.1117/1.JMM.20.3.031011},

year  = {2021},

date = {2021-01-01},

journal = {Journal of Micro/Nanopatterning, Materials, and Metrology},

volume = {20},

number = {3},

pages = {1 -- 19},

publisher = {SPIE},

keywords = {},

pubstate = {published},

tppubtype = {article}

}

@article{10.1117/1.JMM.20.3.031011b,

title = {Picometer sensitivity metrology for EUV absorber phase},

author = {Stuart Sherwin and Isvar A Cordova and Ryan H Miyakawa and Markus P Benk and Laura Waller and Andrew R Neureuther and Patrick Naulleau},

url = {https://doi.org/10.1117/1.JMM.20.3.031011},

doi = {10.1117/1.JMM.20.3.031011},

year  = {2021},

date = {2021-01-01},

journal = {Journal of Micro/Nanopatterning, Materials, and Metrology},

volume = {20},

number = {3},

pages = {1 -- 19},

publisher = {SPIE},

keywords = {},

pubstate = {published},

tppubtype = {article}

}

@article{gunjala2020extreme,

title = {Extreme ultraviolet microscope characterization using photomask surface roughness },

author = {Gautam Gunjala and Antoine Wojdyla and Stuart Sherwin and Aamod Shanker and Markus P. Benk and Kenneth A. Goldberg and Patrick P. Naulleau and Laura Waller },

url = {https://doi.org/10.1038/s41598-020-68588-w},

doi = {10.1038/s41598-020-68588-w},

year  = {2020},

date = {2020-07-15},

journal = {Scientific Reports},

volume = {10},

number = {1},

pages = {11673},

keywords = {},

pubstate = {published},

tppubtype = {article}

}

@article{gunjala2018aberration,

title = {Aberration recovery by imaging a weak diffuser},

author = { Gautam Gunjala and Stuart Sherwin and Aamod Shanker and Laura Waller},

url = {https://doi.org/10.1364/OE.26.021054},

doi = {10.1364/OE.26.021054},

year  = {2018},

date = {2018-08-06},

journal = {Optics express},

volume = {26},

number = {16},

pages = {21054--21068},

publisher = {Optical Society of America},

keywords = {},

pubstate = {published},

tppubtype = {article}

}

@article{10.1117/1.JMM.16.4.041012,

title = {Modeling high-efficiency extreme ultraviolet etched multilayer phase-shift masks},

author = {Stuart Sherwin and Andrew Neureuther and Patrick Naulleau},

url = {https://doi.org/10.1117/1.JMM.16.4.041012},

doi = {10.1117/1.JMM.16.4.041012},

year  = {2017},

date = {2017-12-09},

journal = {Journal of Micro/Nanolithography, MEMS, and MOEMS},

volume = {16},

number = {4},

pages = {1 -- 15},

publisher = {SPIE},

keywords = {},

pubstate = {published},

tppubtype = {article}

}