Rene Claus

@inproceedings{claus2015aberration,

title = {Aberration estimation using EUV mask roughness},

author = { Rene A Claus and Antoine Wojdyla and Markus P Benk and Kenneth A Goldberg and Andrew R Neureuther and Patrick P Naulleau and Laura Waller},

year  = {2015},

date = {2015-01-01},

booktitle = {Extreme Ultraviolet (EUV) Lithography VI},

volume = {9422},

pages = {942214},

organization = {International Society for Optics and Photonics},

keywords = {},

pubstate = {published},

tppubtype = {inproceedings}

}

@inproceedings{claus2015partially,

title = {Partially coherent quantitative phase retrieval for EUV lithography},

author = { Rene A Claus and Yow-Gwo Wang and Markus P Benk and Kenneth A Goldberg and Patrick P Naulleau and Andrew R Neureuther and Laura Waller},

year  = {2015},

date = {2015-01-01},

booktitle = {Imaging Systems and Applications},

pages = {ITh2A--4},

organization = {Optical Society of America},

keywords = {},

pubstate = {published},

tppubtype = {inproceedings}

}

@inproceedings{claus2015phase,

title = {Phase measurements of EUV mask defects},

author = { Rene A Claus and Yow-Gwo Wang and Antoine Wojdyla and Markus P Benk and Kenneth A Goldberg and Andrew R Neureuther and Patrick P Naulleau and Laura Waller},

year  = {2015},

date = {2015-01-01},

booktitle = {Extreme Ultraviolet (EUV) Lithography VI},

volume = {9422},

pages = {942217},

organization = {International Society for Optics and Photonics},

keywords = {},

pubstate = {published},

tppubtype = {inproceedings}

}

@inproceedings{claus2014effect,

title = {Effect of amplitude roughness on EUV mask specifications},

author = { Rene A Claus and Andrew R Neureuther and Patrick P Naulleau and Laura Waller},

url = {https://doi.org/10.1117/12.2069073},

doi = {10.1117/12.2069073},

year  = {2014},

date = {2014-10-08},

booktitle = {Photomask Technology 2014},

volume = {9235},

pages = {92351A},

organization = {International Society for Optics and Photonics},

keywords = {},

pubstate = {published},

tppubtype = {inproceedings}

}

@inproceedings{jingshan2014non,

title = {Non-uniform sampling and Gaussian process regression in transport of intensity phase imaging},

author = { Zhong Jingshan and Rene A Claus and Justin Dauwels and Lei Tian and Laura Waller},

url = {https://doi.org/10.1109/ICASSP.2014.6855115},

doi = {10.1109/ICASSP.2014.6855115},

year  = {2014},

date = {2014-05-04},

booktitle = {2014 IEEE International Conference on Acoustics, Speech and Signal Processing (ICASSP)},

pages = {7784--7788},

organization = {IEEE},

keywords = {},

pubstate = {published},

tppubtype = {inproceedings}

}

@inproceedings{claus2014predicting,

title = {Predicting LER PSD caused by mask roughness using a mathematical model},

author = { Rene A Claus and Andrew R Neureuther and Laura Waller and Patrick P Naulleau},

url = {https://doi.org/10.1117/12.2046637},

doi = {10.1117/12.2046637},

year  = {2014},

date = {2014-04-17},

booktitle = {Extreme Ultraviolet (EUV) Lithography V},

volume = {9048},

pages = {90482X},

organization = {International Society for Optics and Photonics},

keywords = {},

pubstate = {published},

tppubtype = {inproceedings}

}

@inproceedings{jingshan2013partially,

title = {Partially coherent phase recovery by Kalman filtering},

author = { Zhong Jingshan and Lei Tian and Rene A Claus and Justin Dauwels and Laura Waller},

url = {https://doi.org/10.1364/FIO.2013.FW6A.9},

doi = {10.1364/FIO.2013.FW6A.9},

year  = {2013},

date = {2013-10-06},

booktitle = {Frontiers in Optics},

pages = {FW6A--9},

organization = {Optical Society of America},

keywords = {},

pubstate = {published},

tppubtype = {inproceedings}

}